High-rate in-plane micro-supercapacitors scribed onto photo paper using in situ femtolaser-reduced graphene oxide/Au nanoparticle microelectrodes

Author:

Li R.-Z.12345,Peng Rui6784,Kihm K. D.1234,Bai S.9101112,Bridges D.1234,Tumuluri U.6784,Wu Z.6784,Zhang T.513141516,Compagnini G.17181920,Feng Z.212284,Hu A.12349

Affiliation:

1. Department of Mechanical, Aerospace, and Biomedical Engineering

2. University of Tennessee

3. Knoxville

4. USA

5. School of Electronic Science and Engineering

6. Center for Nanophase Materials Sciences and Chemical Science Division

7. Oak Ridge National Laboratory

8. Oak Ridge

9. Institute of Laser Engineering

10. Beijing University of Technology

11. Beijing 100124

12. China

13. Southeast University

14. Key Laboratory of Micro-Inertial Instrument and Advanced Navigation Technology

15. Ministry of Education

16. Nanjing 210096

17. Dipartmento di Scienze Chimiche

18. Università di Catania

19. Catania 95125

20. Italy

21. Materials Processing and Joining

22. Materials Science and Technology Division Oak Ridge National Laboratory

Abstract

Direct laser-reduction of graphene oxide (GO), as a lithography-free approach, has been proven effective in manufacturing in-plane micro-supercapacitors (MSCs) with fast ion diffusion.

Funder

University of Tennessee

Beijing University of Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Pollution,Nuclear Energy and Engineering,Renewable Energy, Sustainability and the Environment,Environmental Chemistry

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