Intense NIR emission in YVO4:Yb3+ thin films by atomic layer deposition
Author:
Affiliation:
1. Department of Chemistry
2. Centre for Materials Science and Nanotechnology
3. University of Oslo
4. 0371 Oslo
5. Norway
Abstract
Thin films of YVO4:Yb3+ exhibiting intense NIR emission have been deposited by atomic layer deposition. The NIR emission is attributed to a quantum splitting process that could be used to enhance the efficiency of solar cells.
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2017/TC/C7TC02135F
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