Cu:NiO as a hole-selective back contact to improve the photoelectrochemical performance of CuBi2O4 thin film photocathodes

Author:

Song Angang12345ORCID,Plate Paul1234,Chemseddine Abdelkrim1234,Wang Fuxian1234,Abdi Fatwa F.1234ORCID,Wollgarten Markus6234ORCID,van de Krol Roel12345ORCID,Berglund Sean P.1234ORCID

Affiliation:

1. Institute for Solar Fuels

2. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

3. 14109 Berlin

4. Germany

5. Institute für Chemie

6. Department Nanoscale Structures and Microscopic Analysis

Abstract

Cu doped NiO (Cu:NiO) back contact layers are inserted between FTO substrates and CuBi2O4 thin films to improve the performance of CuBi2O4 photocathodes.

Funder

Bundesministerium für Bildung und Forschung

China Scholarship Council

China Postdoctoral Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

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