Branched benzocyclobutene polysiloxane with excellent photo-patterning and low dielectric properties-Reference-Cited by-同舟云学术

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Branched benzocyclobutene polysiloxane with excellent photo-patterning and low dielectric properties

Published:2024 Issue:4 Volume:2 Page:606-611
ISSN:2755-371X
Container-title:RSC Applied Polymers
language:en
Short-container-title:RSC Appl. Polym.

Author:

Peng Juan¹,Guo Chao¹,Hu Xinyu¹,Du Hanlin¹,Peng Qiuxia²^ORCID,Hu Huan³,Yuan Wentao¹,Yang Junxiao¹^ORCID,Ma Jiajun¹^ORCID

Affiliation:

1. School of Materials and Chemistry and State Key Laboratory of Environmentally-friendly Energy Materials, Southwest University of Science and Technology, Mianyang 621010, China

2. School of Materials Science and Engineering, Sichuan University of Science & Engineering, Zigong 643000, China

3. Tiannuo Photoelectric Material Co., Ltd, Ji'nan, 250000, China

Abstract

A silicone resin encapsulated negative photoresist has low dielectric properties (k = 2.75), good film-forming performance, and a photolithography patterning effect.

Funder

Southwest University of Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/LP/D4LP00109E

Reference32 articles.

1. Direct Heat-Induced Patterning of Inorganic Nanomaterials

2. Direct optical lithography of functional inorganic nanomaterials

3. Photo-optical Control with Large Refractive Index Changes by Photodimerization of Poly(vinyl cinnamate) Film

4. The synthesis, characterization, and photoinitiated cationic polymerization of silicon-containing epoxy resins

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