1. J. Liang , S.Yeh, S. S.Wong and H.-S. P.Wong, Proc. 4th IEEE Int. Memory Workshop, Milan, Italy, 2012, p. 1
2. A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5−x/TaO2−x bilayer structures
3. K. Aratani , K.Ohba, T.Mizuguchi, S.Yasuda, T.Shiimoto, T.Tsushima, T.Sone, K.Endo, A.Kouchiyama, S.Sasaki, A.Maesaka, N.Yamada and H.Narisawa, Tech. Dig. of the Int. Electron Devices Meet, Washington DC, USA, 2007, p. 783
4. Nanoionics-based resistive switching memories
5. W. Otsuka , K.Miyata, M.kitagawa, K.Tsutsui, T.Tsushima, H.Yoshinara, T.Namise, Y.Terao and K.Ogata, Int. Solid-State Circuits Conference Digest of Tech. Papers, San Francisco, CA, USA, 2011, p. 209