Ab initio study on the rate constants of SiCl4 + H→SiCl3 + HCl-Reference-Cited by-同舟云学术

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Ab initio study on the rate constants of SiCl4 + H→SiCl3 + HCl

Published:2001 Issue:6 Volume:3 Page:965-969
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Zhang Xiang,Ding Yi-hong,Li Ze-sheng,Huang Xu-ri,Sun Chia-chung

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2001/CP/B006856J

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical Investigations for Kinetics of the Chemical Reactions: H + SiCl_x (x = 1, 2, 3);The Journal of Physical Chemistry A;2022-03-08

2. Theoretical Reassessment and Model Validation of Some Kinetic Parameters Relevant to Si/Cl/H Systems;The Journal of Physical Chemistry A;2021-03-22

3. Molecular adsorption and surface formation reactions of HCl, H2 and chlorosilanes on Si(100)-c(4 × 2) with applications for high purity silicon production;Applied Surface Science;2019-05

4. First Principles Investigation of HCl, H2, and Chlorosilane Adsorption on Cu3Si Surfaces with Applications for Polysilicon Production;The Journal of Physical Chemistry C;2018-08-09

5. Solar grade silicon production: A review of kinetic, thermodynamic and fluid dynamics based continuum scale modeling;Renewable and Sustainable Energy Reviews;2017-10

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