Multi-step proportional miniaturization to sub-micron dimensions using pre-stressed polymer films-Reference-Cited by-同舟云学术

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Multi-step proportional miniaturization to sub-micron dimensions using pre-stressed polymer films

Published:2020 Issue:11 Volume:2 Page:5461-5467
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Sayed Shady¹²³⁴,Selvaganapathy P. Ravi¹²³⁴^ORCID

Affiliation:

1. Department of Mechanical Engineering

2. McMaster University

3. Hamilton

4. Canada

Abstract

Multi-step miniaturization to sub-micron dimensions using shrinkable polymer films.

Funder

Natural Sciences and Engineering Research Council of Canada

Ontario Research Foundation

Canada Research Chairs

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NA/D0NA00785D

Reference17 articles.

1. Advances in Patterning Materials for 193 nm Immersion Lithography

2. Advances in Nanoimprint Lithography

3. Soft lithography for micro- and nanoscale patterning

4. Ten years of two-color photolithography [Invited]

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sub‐Micron Diffractive Optical Elements Facilitated by Intrinsic Deswelling of Auxetic Liquid Crystal Elastomers;Advanced Optical Materials;2024-06-27

2. High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking;Microsystems & Nanoengineering;2022-02-14

3. Nanoscale self-assembly: concepts, applications and challenges;Nanotechnology;2022-01-07

4. Constrained shrinking of nanoimprinted pre-stressed polymer films to achieve programmable, high-resolution, miniaturized nanopatterns;Nanotechnology;2021-09-22

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