Improvement on contamination resistance to volatile organics and moisture of sol–gel silica antireflective coating for 351 nm laser system by structural modulation with fluorinated compounds-Reference-Cited by-同舟云学术

Improvement on contamination resistance to volatile organics and moisture of sol–gel silica antireflective coating for 351 nm laser system by structural modulation with fluorinated compounds

Published:2015 Issue:6 Volume:5 Page:4529-4536
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Zhang Qinghua¹²³,Wei Yaowei¹²³,Yang Wei¹²³,Hui Haohao¹²³,Deng Xueran¹²³,Wang Jian¹²³,Xu Qiao¹²³,Shen Jun⁴⁵⁶⁷³

Affiliation:

1. Chengdu Fine Optical Engineering Research Center

2. Chengdu 610041

3. China

4. Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology

5. Pohl Institute of Solid State Physics

6. Tongji University

7. Shanghai 200092

Abstract

A novel silica coating with durable AR performance under volatile organics and moisture condition was obtained by using DFDO as porosity modulator, and PHFBA as filler to protect it from contamination.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C4RA10028J

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5. Improvement on laser-induced damage threshold of sol-gel ZrO_2 coatings by crystal structure tuning

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