Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatment-Reference-Cited by-同舟云学术

Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatment

Published:2019 Issue:2 Volume:9 Page:730-737
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Hwang Chahwan¹²³⁴,Heo Jae Sang⁵²³⁴⁶,Kim Kyung-Tae⁵²³⁴,Kang Yeo Kyung¹²³⁴,Choi Byungdoo¹²³⁴,Kim Yong-Hoon⁷⁸⁹¹⁰⁴^ORCID,Facchetti Antonio¹¹¹¹²¹³¹⁴,Park Sung Kyu⁵²³⁴^ORCID,Kim Myung-Gil¹²³⁴^ORCID

Affiliation:

1. Department of Chemistry

2. Chung-Ang University

3. Seoul 06980

4. Korea

5. School of Electrical and Electronics Engineering

6. Department of Medicine

7. SKKU Advanced Institute of Nanotechnology (SAINT)

8. School of Advanced Materials Science and Engineering

9. Sungkyunkwan University

10. Suwon 16419

11. The Materials Research Center

12. Northwestern University

13. Evanston

14. USA

Abstract

Deep ultraviolet (DUV)-treatment is an efficient method for the removal of high-energy-barrier polymeric or aliphatic organic ligands from nanomaterials.

Funder

Chung-Ang University

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/RA/C8RA08173E

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1. Graphene-based gas sensor: metal decoration effect and application to a flexible device

2. High-Performance Flexible Broadband Photodetector Based on Organolead Halide Perovskite