Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length-Reference-Cited by-同舟云学术

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Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

Published:2010-12-02 Issue:2 Volume:18 Page:143-147
ISSN:0909-0495
Container-title:Journal of Synchrotron Radiation
language:
Short-container-title:J Synchrotron Radiat

Author:

Lee S. Y.,Cho I. H.,Kim J. M.,Kang H. C.,Noh D. Y.

Publisher

International Union of Crystallography (IUCr)

Subject

Instrumentation,Nuclear and High Energy Physics,Radiation

Link

http://journals.iucr.org/s/issues/2011/02/00/gf5029/gf5029.pdf

Reference27 articles.

1. Zone plates for hard X-rays fabricated with the SPCVD technology

2. Born, M. & Wolf, E. (1980). Principles of Optics, 6th ed. New York: Pergamon.

3. Fabrication limits of electron beam lithography and of UV, X -ray and ion-beam lithographies

4. Soft X-ray microscopy at a spatial resolution better than 15 nm

5. Demonstration of 12 nm Resolution Fresnel Zone Plate Lens based Soft X-ray Microscopy

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1. Controlling near-field focusing of a mesoscale binary phase plate in an optical radiation field with circular polarization;Computer Optics;2021-07

2. Study of focusing parameters of wavelength-scale binary phase Fresnel zone plate;Journal of Optics;2021-04-27

3. Axial intensity distribution of a micro-Fresnel zone plate at an arbitrary numerical aperture;Optics Express;2021-04-02

4. Time-resolved X-ray diffraction system for study of Pb(Zr, Ti)O3 films under a temporal electric field at BL15XU, SPring-8;Review of Scientific Instruments;2019-09

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