An ultrahigh-vacuum goniometer for in situ soft X-ray standing-wave analysis of semiconductor surfaces
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Published:1998-05-01
Issue:3
Volume:5
Page:1029-1031
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ISSN:0909-0495
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Container-title:Journal of Synchrotron Radiation
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language:
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Short-container-title:J Synchrotron Radiat
Author:
Sugiyama Munehiro,Maeyama Satoshi
Abstract
An ultrahigh-vacuum goniometer was developed for in situ X-ray standing-wave (XSW) analysis of semiconductor surfaces prepared by molecular-beam epitaxy (MBE). Although two ultrahigh-vacuum motors for χ and φ rotating axes are inside the analysis chamber, low-energy photoelectrons can still be collected as the magnetic field is sufficiently suppressed by using metal shields. Furthermore, the sample can be annealed at temperatures higher than 870 K on the goniometer in the analysis chamber. This goniometer is used at beamline 1A (BL-1A) at the Photon Factory, where both monochromated soft X-rays and UV radiation are available. This analysis system was shown to be suitable not only for in situ soft-XSW and X-ray absorption near-edge structure (XANES) studies but also for synchrotron radiation photoelectron spectroscopy (SRPES) studies. The annealing effects on an S-adsorbed GaAs(001) surface could be studied by SRPES, XANES and XSW using this new goniometer.
Publisher
International Union of Crystallography (IUCr)
Subject
Instrumentation,Nuclear and High Energy Physics,Radiation
Cited by
1 articles.
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