Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker-Reference-Cited by-同舟云学术

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Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Published:2017-11-24 Issue:1 Volume:8 Page:
ISSN:2041-1723
Container-title:Nature Communications
language:en
Short-container-title:Nat Commun

Author:

Choi Chungryong,Park Jichoel,Vincent Joseph Kanniyambatti L.,Lee Jaeyong,Ahn Seonghyeon,Kwak Jongheon,Lee Kyu Seong,Kim Jin Kon

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,General Biochemistry, Genetics and Molecular Biology,General Chemistry

Link

http://www.nature.com/articles/s41467-017-02019-9.pdf

Reference67 articles.

1. Leibler, L. Theory of microphase separation in block copolymers. Macromolecules 13, 1602–1607 (1980).

2. Lopes, W. A. & Jaeger, H. M. Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds. Nature 414, 735–738 (2001).

3. Kim, H. C., Park, S. M. & Hinsberg, W. D. Block copolymer based nanostructures: materials, processes, and applications to electronics. Chem. Rev. 110, 146–177 (2010).

4. Jung, Y. S., Chang, J. B., Verploegen, E., Berggren, K. K. & Ross, C. A. A path to ultranarrow patterns using self-assembled lithography. Nano Lett. 10, 1000–1005 (2010).

5. Park, M., Harrison, C., Chaikin, P. M., Register, R. A. & Adamson, D. H. Block copolymer lithography: periodic arrays of similar to 10(11) holes in 1 square centimeter. Science 276, 1401–1404 (1997).

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