Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
Author:
Funder
National Research Foundation of Korea
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/s41598-018-35154-4.pdf
Reference42 articles.
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2. Yeung, K. S. & Lam, Y. W. A Simple Chemical Vapour Deposition Method for Depositing Thin TiO2 Films. Thin Solid Films 109(2), 169–178 (1983).
3. Baba, K., Bulou, S., Choquet, P. & Boscher, N. D. Photocatalytic Anatase TiO2 Thin Films on Polymer Optical Fiber Using Atmospheric-PressurePlasma. ACS Appl. Mater. Interfaces 9(15), 13733–13741 (2017).
4. Daghrir, R., Drogui, P. & Robert, D. Modified TiO2 for Environmental Photocatalytic Applications: A Review. Ind. Eng. Chem. Res. 52, 3581–3599 (2013).
5. Guan, K. Relationship between Photocatalytic Activity, Hydrophilicity and Self-Cleaning Effect of TiO2/SiO2 Films. Surf. Coat. Technol. 191(2-3), 155–160 (2005).
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