Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/srep30450.pdf
Reference40 articles.
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2. Sivasubramaniam, S. & Alkaisi, M. M. Inverted nanopyramid texturing for silicon solar cells using interference lithography. Microelectron. Eng. 119, 146–150 (2014).
3. Chua, J. K. & Murukeshan, V. M. Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography. Phys. Scr. 80, 015401 (2009).
4. Shoji, S., Sun, H.-B. & Kawata, S. Photofabrication of wood-pile three-dimensional photonic crystals using four-beam laser interference. Appl. Phys. Lett. 83, 608–610 (2003).
5. Amako, J. & Sawaki, D. Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence. Appl. Opt. 51, 3526–3532 (2012).
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