Spatial patterns and infestation processes in the horse chestnut leafminer Cameraria ohridella : a tale of two cities
Author:
Publisher
Wiley
Subject
Insect Science,Ecology, Evolution, Behavior and Systematics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1046/j.1570-7458.2003.00038.x/fullpdf
Reference30 articles.
1. Assessing the significance of the correlation between two spatial processes;Clifford;Biometrics,1989
2. Measurements of wind velocities in a street canyon;DePaul;Atmospheric Environment,1986
3. Modifying the t-test for assessing the correlation between two spatial processes;Dutilleul;Biometrics,1993
4. Mutualistic interaction between a weevil and a rust fungus, two parasites of the weed Cirsium arvense;Friedli;Oecologia,2001
5. Spatial patterns of invading Dendroctonus micans (Coleoptera: Scolytidae) populations in the United Kingdom;Gilbert;Canadian Journal of Forest Research,2003
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