Plasma-Deposited Fluorocarbon Films: Insulation Material for Microelectrodes and Combined Atomic Force Microscopy−Scanning Electrochemical Microscopy Probes-Reference-Cited by-同舟云学术

Plasma-Deposited Fluorocarbon Films: Insulation Material for Microelectrodes and Combined Atomic Force Microscopy−Scanning Electrochemical Microscopy Probes

Published:2008-05-30 Issue:13 Volume:80 Page:5260-5265
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Wiedemair Justyna¹,Balu Balamurali¹,Moon Jong-Seok¹,Hess Dennis W.¹,Mizaikoff Boris¹,Kranz Christine¹

Affiliation:

1. School of Chemistry and Biochemistry, and School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ac800246q

Reference58 articles.

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3. Wightman, R. M. and Wipf, D. O.InElectroanalytical. Chemistry;Bard, A. J., Ed.Marcel Dekker, Inc.:New York, 1989; Vol.15, pp267−353

4. Fleischmann, M., Pons, S., Rolison, D. R., and Schmidt, P. P.Ultramicroelectrodes;Datatech Systems Inc.:Morgantown, NC, 1987; pp226−238.

5. Preparation and characterization of STM tips for electrochemical studies

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