Perfect Absorption at the Ultimate Thickness Limit in Planar Films-Reference-Cited by-同舟云学术

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Perfect Absorption at the Ultimate Thickness Limit in Planar Films

Published:2023-11-09 Issue:12 Volume:10 Page:4244-4251
ISSN:2330-4022
Container-title:ACS Photonics
language:en
Short-container-title:ACS Photonics

Author:

Sakotic Zarko¹^ORCID,Ware Alexander¹^ORCID,Povinelli Michelle²,Wasserman Daniel¹^ORCID

Affiliation:

1. Electrical and Computer Engineering, University of Texas at Austin, Austin, Texas 78758, United States

2. Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, California 90089, United States

Funder

Defense Advanced Research Projects Agency

Sandia National Laboratories

National Defense Science and Engineering Graduate

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Biotechnology,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsphotonics.3c01017

Reference62 articles.

1. �ber die optischen Konstanten d�nner Metallschichten im langwelligen Ultrarot

2. Reflection and Transmission Interference Filters Part I Theory

3. Salisbury, W. W. Absorbent body for electromagnetic waves. U.S. Patent 2,599,944, 1952.

4. Reflection properties of the Salisbury screen

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mid‐Infrared Perfect Absorption with Planar and Subwavelength‐Perforated Ultrathin Metal Films;Advanced Physics Research;2024-06-20

2. Absorbing Perfectly at the Ultimate Thickness Limit;CLEO 2024;2024

3. INVESTIGATION OF COUPLING MECHANISM OF HEAT TRANSFER PROCESS IN POROUS MEDIUM BASED ON ENTRANSY ANALYSIS MODEL;Proceeding of 9th Thermal and Fluids Engineering Conference (TFEC);2024

4. Wavelength Tunable Infrared Perfect Absorption in Plasmonic Nanocrystal Monolayers;ACS Nano;2023-12-20

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