Imprint Lithography with Degradable Elastomeric Polyanhydrides
Author:
Affiliation:
1. Department of Chemistry and Biomolecular Science and Center for Advanced Materials Processing, Clarkson University, Potsdam, New York 13699-5810, United States
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am301312n
Reference35 articles.
1. Imprint Lithography with 25-Nanometer Resolution
2. A Photocurable Poly(dimethylsiloxane) Chemistry Designed for Soft Lithographic Molding and Printing in the Nanometer Regime
3. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques
4. Sub-15nm Optical Fiber Nanoimprint Lithography: A Parallel, Self-aligned and Portable Approach
5. Low-Cost Fabrication of Transparent Hard Replica Molds for Imprinting Lithography
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