Ultrahigh Photosensitivity Based on Single-Step Lay-on Integration of Freestanding Two-Dimensional Transition-Metal Dichalcogenide-Reference-Cited by-同舟云学术

Ultrahigh Photosensitivity Based on Single-Step Lay-on Integration of Freestanding Two-Dimensional Transition-Metal Dichalcogenide

Published:2024-01-29 Issue:5 Volume:18 Page:4432-4442
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Jeong Hyun¹²^ORCID,Nomenyo Komla¹³⁴,Oh Hye Min⁵,Gwiazda Agnieszka¹,Yun Seok Joon³⁶,Chevalier César Clotaire¹,Salas-Montiel Rafael¹,Wourè-Nadiri Bayor Sibiri⁴,Jeong Mun Seok²^ORCID,Lee Young Hee³⁶^ORCID,Lérondel Gilles¹³

Affiliation:

1. Laboratoire Lumière, nanomatériaux et nanotechnologie, CNRS UMR 7076, Université de Technologie de Troyes, BP 2060, 10010 Troyes, France

2. Department of Physics, Hanyang University, Seoul 04763, Republic of Korea

3. Department of Energy Science, Sungkyunkwan University, Suwon 440-746, Republic of Korea

4. Département de Génie Electrique, Ecole Nationale Supérieure d’Ingénieurs (ENSI), Université de Lomé, BP 1515 Lomé, Togo

5. Department of Physics, Kunsan National University, Kunsan, 54150, Republic of Korea

6. Center for Integrated Nanostructure Physics (CINAP), Institute for Basic Science (IBS), Sungkyunkwan University, Suwon 16419, Republic of Korea

Funder

National Research Foundation of Korea

FUI MULTISS

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.3c10721

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