Interfacial Electron Beam Lithography Converts an Insulating Organic Monolayer to a Patterned Single-Layer Conductor with Puzzling Charge Transport Performance-Reference-Cited by-同舟云学术

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Interfacial Electron Beam Lithography Converts an Insulating Organic Monolayer to a Patterned Single-Layer Conductor with Puzzling Charge Transport Performance

Published:2024-07-09 Issue:29 Volume:18 Page:18948-18962
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Maoz Rivka¹,Nelson Peter¹,Gogoi Bedanta¹,Burshtain Doron¹,Talukder Santanu¹,Zou Shuangyang¹^ORCID,Sarkar Arup¹,Berson Jonathan¹^ORCID,Sagiv Jacob¹^ORCID

Affiliation:

1. Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 7610001, Israel

Funder

Tom and Mary Beck Center for Advanced and Intelligent Materials

Estate of Betty Weneser

Kimmel Center for Nanoscale Science

Klaff Family Foundation

Roland N. Karlen Foundation

Estate of Gerald Alexander

Ilse Katz Institute for Material Sciences and Magnetic Resonance Research

Anita James Rosen Foundation

Dweck Family Foundation

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.4c02074

Reference47 articles.

1. Interfacial Electron Beam Lithography: Chemical Monolayer Nanopatterning via Electron-Beam-Induced Interfacial Solid-Phase Oxidation

2. Generation of Surface Amino Groups on Aromatic Self-Assembled Monolayers by Low Energy Electron Beams—A First Step Towards Chemical Lithography

3. Chemical Nanolithography with Electron Beams

4. Pattern Formation through Selective Chemical Transformation of Imine Group of Self-Assembled Monolayer by Low-Energy Electron Beam

5. Gold Nanoparticle Patterning of Silicon Wafers Using Chemical e-Beam Lithography

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