Density Functional Theory Study of Atomic Nitrogen on the Si(100)−(2 × 1) Surface-Reference-Cited by-同舟云学术

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Density Functional Theory Study of Atomic Nitrogen on the Si(100)−(2 × 1) Surface

Published:2002-02-07 Issue:10 Volume:106 Page:2643-2648
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Widjaja Yuniarto¹,Heyman Annica²,Musgrave Charles B.³

Affiliation:

1. Department of Chemical Engineering, Stanford University, Stanford, California 94305

2. Department of Electrical Engineering, Stanford University, Stanford, California 94305

3. Departments of Chemical Engineering and Materials Science and Engineering, Stanford University, Stanford, California 94305

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp013335r

Reference36 articles.

1. Properties of PECVD SiO x N y Films as Selective Diffusion Barrier

2. Formation of Silicon Nitride at a Si ‐ SiO2 Interface during Local Oxidation of Silicon and during Heat‐Treatment of Oxidized Silicon in NH 3 Gas

3. Sodium diffusion in plasma‐deposited amorphous oxygen‐doped silicon nitride (a‐SiON:H) films

4. Fixed and trapped charges at oxide–nitride–oxide heterostructure interfaces formed by remote plasma enhanced chemical vapor deposition

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. CASSCF and MRMP2 investigation of the interaction of arsenic adatoms with carbon dimers on the diamond (100)-2 × 1 surface;Surface Science;2015-11

2. Plasma enhanced atomic layer deposition of SiNx:H and SiO2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-07

3. First-principles study on mixed Si10−nNn (n=0−10) clusters;Physica B: Condensed Matter;2010-03

4. First-principles study on mixed Sin−1N (n=1–19) clusters;Physica B: Condensed Matter;2009-06

5. Addition of POSS−T8 to the Si(100) Surface;The Journal of Physical Chemistry C;2008-01-01

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