Ab Initio Chemical Kinetic Study for Reactions of H Atoms with SiH4 and Si2H6: Comparison of Theory and Experiment
Author:
Affiliation:
1. Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
2. Center for Interdisciplinary Molecular Science, Institute of Molecular Science, National Chiao Tung University, Hsinchu 300, Taiwan
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp908222g
Reference53 articles.
1. Thin-Film Silicon –Growth Process and Solar Cell Application–
2. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method
3. Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications
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