Synthesis of 5,5-Bicyclic Amidines as Ligands for Thermally Stable Vapor Deposition Precursors
Author:
Affiliation:
1. Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, United States
Publisher
American Chemical Society (ACS)
Subject
Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.organomet.6b00954
Reference23 articles.
1. Atomic Layer Deposition: An Overview
2. ALD Precursors and Reaction Mechanisms
3. A brief review of atomic layer deposition: from fundamentals to applications
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