Tailoring Porous Silica Films through Supercritical Carbon Dioxide Processing of Fluorinated Surfactant Templates-Reference-Cited by-同舟云学术

Tailoring Porous Silica Films through Supercritical Carbon Dioxide Processing of Fluorinated Surfactant Templates

Published:2006-12-21 Issue:2 Volume:111 Page:363-370
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Ghosh Kaustav¹,Vyas Sandhya M.¹,Lehmler Hans-Joachim¹,Rankin Stephen E.¹,Knutson Barbara L.¹

Affiliation:

1. Department of Chemical and Materials Engineering, University of Kentucky, Lexington, Kentucky 40506-0046, and Department of Occupational and Environmental Health, University of Iowa, Iowa City, Iowa 52242-5000

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0656680

Reference87 articles.

1. Synthesis and Applications of Molecular Sieve Layers and Membranes

2. Registered growth of mesoporous silica films on graphite

3. Hybrid Organic−Inorganic Quaternary Ammonium Organosilane Functionalized Mesoporous Thin Films

4. Self-Assembly of an Environmentally Responsive Polymer/Silica Nanocomposite

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