Manipulating Nanopatterns on Two-Dimensional MoS<sub>2</sub> Monolayers via Atomic Force Microscopy-Based Thermomechanical Nanolithography for Optoelectronic Device Fabrication-Reference-Cited by-同舟云学术

Manipulating Nanopatterns on Two-Dimensional MoS₂ Monolayers via Atomic Force Microscopy-Based Thermomechanical Nanolithography for Optoelectronic Device Fabrication

Published:2023-05-05 Issue:10 Volume:6 Page:8346-8357
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Chang Shunyu¹²,Yan Yongda¹²,Geng Yanquan¹²^ORCID

Affiliation:

1. The State Key Laboratory of Robotics and Systems, Robotics Institute, Harbin Institute of Technology, Harbin 150080, Heilongjiang, P. R. China

2. Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001, Heilongjiang, P. R. China

Funder

China Association for Science and Technology

Natural Science Foundation of Heilongjiang Province

Fundamental Research Funds for the Central Universities

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.3c00588

Reference63 articles.

1. Engineering Bandgaps of Monolayer MoS2and WS2on Fluoropolymer Substrates by Electrostatically Tuned Many-Body Effects

2. Indirect Bandgap Puddles in Monolayer MoS2by Substrate-Induced Local Strain

3. Efficient strain modulation of 2D materials via polymer encapsulation

4. Bandgap broadening at grain boundaries in single-layer MoS2

5. Tuning bandstructure of folded MoS2 through fluid dynamics

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