Symmetry Engineering of Epitaxial Hf0.5Zr0.5O2 Ultrathin Films-Reference-Cited by-同舟云学术

Symmetry Engineering of Epitaxial Hf_0.5Zr_0.5O₂ Ultrathin Films

Published:2024-05-14 Issue:21 Volume:16 Page:27532-27540
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

De Arnab¹,Jung Min-Hyoung²,Kim Young-Hoon²,Bae Seong Bin³,Jeong Seung Gyo¹,Oh Jin Young¹,Choi Yeongju¹,Lee Hojin⁴,Kim Yunseok⁵^ORCID,Choi Taekjib⁴^ORCID,Kim Young-Min²,Yang Sang Mo³^ORCID,Jeong Hu Young⁶^ORCID,Choi Woo Seok¹^ORCID

Affiliation:

1. Department of Physics, Sungkyunkwan University, Suwon 16419, Republic of Korea

2. Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea

3. Department of Physics, Sogang University, Seoul 04107, Republic of Korea

4. Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 143-747, Republic of Korea

5. School of Advanced Materials and Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea

6. Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.4c03146

Reference46 articles.

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2. Applications of Modern Ferroelectrics

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4. Ultra-thin ferroelectrics

5. An Interface‐Type Memristive Device for Artificial Synapse and Neuromorphic Computing

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