Thermal Dehydrogenation Impact on Positive Bias Stability of Amorphous InSnZnO Thin-Film Transistors-Reference-Cited by-同舟云学术

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Thermal Dehydrogenation Impact on Positive Bias Stability of Amorphous InSnZnO Thin-Film Transistors

Published:2024-07-16 Issue: Volume: Page:
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Lee Sein¹²^ORCID,Song Young-Woong¹^ORCID,Park Jeong-Min¹^ORCID,Lee Junseo¹²^ORCID,Ham Wooho¹²^ORCID,Song Min-Kyu¹³^ORCID,Namgung Seok Daniel⁴^ORCID,Shin Dongwook¹^ORCID,Kwon Jang-Yeon¹²^ORCID

Affiliation:

1. School of Integrated Technology, Yonsei University, Seoul 03722, Republic of Korea

2. BK21 Graduate Program in Intelligent Semiconductor Technology, Yonsei University, Incheon 21983, Republic of Korea

3. Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States

4. School of Electrical and Electronics Engineering, Chung-Ang University, Seoul 06974, Republic of Korea

Funder

Samsung Display

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.4c03689

Reference49 articles.

1. Review paper: Transparent amorphous oxide semiconductor thin film transistor

2. An amorphous oxide semiconductor thin-film transistor route to oxide electronics

3. Bottom-Gate Gallium Indium Zinc Oxide Thin-Film Transistor Array for High-Resolution AMOLED Display

4. Effect of ELA Energy Density on Self-Heating Stress in Low-Temperature Polycrystalline Silicon Thin-Film Transistors

5. Improvement of InGaZnO4Thin Film Transistors Characteristics Utilizing Excimer Laser Annealing

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