MOCVD Deposition of MgAl2O4 Films Using Metal Alkoxide Precursors-Reference-Cited by-同舟云学术

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MOCVD Deposition of MgAl2O4 Films Using Metal Alkoxide Precursors

Published:1994-10-01 Issue:10 Volume:6 Page:1615-1619
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Rocheleau Richard E.,Zhang Zhe,Gilje John W.,Meese-Marktscheffel Juliane A.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00046a009

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