Low Temperature Chemical Vapor Deposition of Hafnium Nitride−Boron Nitride Nanocomposite Films-Reference-Cited by-同舟云学术

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Low Temperature Chemical Vapor Deposition of Hafnium Nitride−Boron Nitride Nanocomposite Films

Published:2009-11-02 Issue:23 Volume:21 Page:5601-5606
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Kumar Navneet¹²,Noh Wontae³²,Daly Scott R.³²,Girolami Gregory S.³²,Abelson John R.¹²

Affiliation:

1. Department of Materials Science and Engineering, University of Illinois at Urbana−Champaign, 1304 W. Green Street, Urbana, Illinois 61801

2. Frederick Seitz Materials Research Laboratory, 104 South Goodwin Avenue, Urbana, Illinois 61801

3. Department of Chemistry, University of Illinois at Urbana−Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm901774v

Reference33 articles.

1. Transition metal carbides, nitrides, and borides for electronic applications

2. Some properties of r.f.-sputtered hafnium nitride coatings

3. Reactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafnium

4. �ber ein braunes Zirkonnitrid Zr3N4

5. Synthesis of cubic zirconium and hafnium nitride having Th3P4 structure

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2. Identification of a Stable B₂H₂ Intermediate in the Decomposition of Zr(BH₄)₄ on the Pd(111) Surface;The Journal of Physical Chemistry C;2024-07-22

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4. Defect Engineering of Nanoscale Hf-Based Metal–Organic Frameworks for Highly Efficient Iodine Capture;Inorganic Chemistry;2021-06-16

5. Stability Evaluation of Candidate Precursors for Chemical Vapor Deposition of Hafnium Diboride (HfB2);ACS Omega;2021-04-23

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