High-Pressure Studies of Trimethylsilane Azide by Raman Scattering and Synchrotron X

High-Pressure Studies of Trimethylsilane Azide by Raman Scattering and Synchrotron X–ray Diffraction

Author:

Wen Yang¹,Zuzhen Shang²,Junru Jiang¹^ORCID,Hongyang Zhu³^ORCID,Xinmei Hou²,Zhijun He²,Jian Zhang⁴^ORCID,Qiliang Cui⁴

Affiliation:

1. School of Science, University of Science and Technology, Liaoning, Anshan 114051, China

2. School of Materials and Metallurgy, University of Science and Technology, Liaoning, Anshan 114051, China

3. School of Physics and Electronic Engineering, Linyi University, Linyi 276005, China

4. State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China

Funder

University of Science and Technology Liaoning

Department of Education of Liaoning Province

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

State Key Laboratory of Superhard Materials of Jilin University

Liaoning Province???s ???Rejuvenating Liaoning TalentsPlan???

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

Reference33 articles.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献