Facile Phase Control of Multivalent Vanadium Oxide Thin Films (V2O5 and VO2) by Atomic Layer Deposition and Postdeposition Annealing-Reference-Cited by-同舟云学术

Facile Phase Control of Multivalent Vanadium Oxide Thin Films (V2O5 and VO2) by Atomic Layer Deposition and Postdeposition Annealing

Published:2017-06-13 Issue:28 Volume:9 Page:23909-23917
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Song Gwang Yeom¹,Oh Chadol²,Sinha Soumyadeep¹,Son Junwoo²,Heo Jaeyeong¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, and Optoelectronics Convergence Research Center, Chonnam National University, Gwangju 61186, Republic of Korea

2. Department of Materials Science and Engineering, Pohang University of Science and Technology, Pohang 37673, Republic of Korea

Funder

National Research Foundation of Korea

Korea Institute of Energy Technology Evaluation and Planning

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b03398

Reference61 articles.

1. Oxide Electronics Utilizing Ultrafast Metal-Insulator Transitions

2. Vanadium pentoxide gels

3. Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide

4. Ozone-Based Atomic Layer Deposition of Crystalline V2O5 Films for High Performance Electrochemical Energy Storage

5. Effect of Meso- and Micro-Porosity in Carbon Electrodes on Atomic Layer Deposition of Pseudocapacitive V2O5 for High Performance Supercapacitors

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