Role of Oxygen Deposition Pressure in the Formation of Ti Defect States in TiO2(001) Anatase Thin Films

Author:

Gobaut Benoit1ORCID,Orgiani Pasquale2ORCID,Sambri Alessia34,di Gennaro Emiliano34,Aruta Carmela34ORCID,Borgatti Francesco5,Lollobrigida Valerio6,Céolin Denis7,Rueff Jean-Pascal78,Ciancio Regina6,Bigi Chiara69,Das Pranab Kumar610,Fujii Jun6,Krizmancic Damjan6,Torelli Piero6,Vobornik Ivana6,Rossi Giorgio69,Miletto Granozio Fabio34ORCID,Scotti di Uccio Umberto34,Panaccione Giancarlo6

Affiliation:

1. Elettra Sincrotrone Trieste S.c.p.A., Basovizza, I-34012 Trieste, Italy

2. CNR—SPIN, UOS Salerno, I-84084 Fisciano, Italy

3. CNR—SPIN, UOS Napoli, I-80126 Napoli, Italy

4. Department of Physics, University of Napoli Federico II, I-80126 Napoli, Italy

5. CNR—ISMN, UOS Bologna, I-40129 Bologna, Italy

6. CNR—IOM, Laboratorio TASC, I-34149 Trieste, Italy

7. Synchrotron SOLEIL, L’Orme des Merisiers, BP 48, Saint Aubin, 91192 Gif sur Yvette, France

8. Laboratoire de Chimie Physique-Matière et Rayonnement, UPMC Université; Paris 06, CNRS, UMR 7614, F-75005 Paris, France

9. Department of Physics, University of Milano, I-20133 Milano, Italy

10. International Centre for Theoretical Physics (ICTP), I-34100 Trieste, Italy

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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