Probing the Dielectric Properties of Ultrathin Al/Al2O3/Al Trilayers Fabricated Using in Situ Sputtering and Atomic Layer Deposition
Author:
Affiliation:
1. Department of Physics and Astronomy, University of Kansas, Lawrence, Kansas 66045, United States
Funder
Army Research Office
Division of Materials Research
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.7b16506
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