Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography
Author:
Affiliation:
1. Institute of Microelectronics and Institute of Physical Chemistry, National Center of Scientific Research Demokritos, 15310 Aghia Paraskevi, Athens, Greece, and Interuniversity Microelectronics Center (IMEC), Kapeldreef 75, B-3001 Leuven, Belgium
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm0605522
Reference46 articles.
1. Organic Materials Challenges for 193 nm Imaging
2. Lithographic Imaging Techniques for the Formation of Nanoscopic Features
3. Liquid immersion lithography: Why, how, and when?
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