Electrodeposited Ni-Based Magnetic Mesoporous Films as Smart Surfaces for Atomic Layer Deposition: An “All-Chemical” Deposition Approach toward 3D Nanoengineered Composite Layers-Reference-Cited by-同舟云学术

Electrodeposited Ni-Based Magnetic Mesoporous Films as Smart Surfaces for Atomic Layer Deposition: An “All-Chemical” Deposition Approach toward 3D Nanoengineered Composite Layers

Published:2018-04-11 Issue:17 Volume:10 Page:14877-14885
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Zhang Jin¹²,Quintana Alberto¹^ORCID,Menéndez Enric¹^ORCID,Coll Mariona³,Pellicer Eva¹^ORCID,Sort Jordi¹⁴^ORCID

Affiliation:

1. Departament de Física, Facultat de Ciències, Universitat Autònoma de Barcelona, E-08193 Bellaterra, Barcelona, Spain

2. State Key laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, Northwestern Polytechnical University, Xi’an, Shaanxi 710072, P. R. China

3. Institut de Ciència de Materials de Barcelona (ICMAB-CSIC) Campus UAB, E-08193 Bellaterra, Barcelona, Spain

4. Institució Catalana de Recerca i Estudis Avançats (ICREA), Passeig Lluís Companys, 23, E-08010 Barcelona, Spain

Funder

Departament d'Innovaci?, Universitats i Empresa, Generalitat de Catalunya

European Regional Development Fund

H2020 Marie Sklodowska-Curie Actions

Secretar?a de Estado de Investigaci?n, Desarrollo e Innovaci?n

H2020 European Research Council

Publisher

American Chemical Society (ACS)

Subject

General Materials Science