Magnetic Patterning by Electron Beam-Assisted Carbon Lithography-Reference-Cited by-同舟云学术

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Magnetic Patterning by Electron Beam-Assisted Carbon Lithography

Published:2018-07-18 Issue:32 Volume:10 Page:27178-27187
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Genoni Pietro¹,Genuzio Francesca²,Menteş Tevfik Onur²,Santos Benito²,Sala Alessandro²³^ORCID,Lenardi Cristina¹,Locatelli Andrea²^ORCID

Affiliation:

1. CIMAINA, Department of Physics, Università degli Studi di Milano, via Celoria 16, I-20133 Milan, Italy

2. Elettra-Sincrotrone Trieste, S.S. 14 km 163.5 in AREA Science Park, Basovizza, I-34149 Trieste, Italy

3. Department of Physics, Università degli Studi di Trieste, via Valerio 2, I-34127 Trieste, Italy

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

http://pubs.acs.org/doi/pdf/10.1021/acsami.8b07485

Reference59 articles.

1. The 2017 Magnetism Roadmap

2. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

3. Ion-beam induced fcc-bcc transition in ultrathin Fe films for ferromagnetic patterning

4. In-situ magnetic nano-patterning of Fe films grown on Cu(100)

5. Planar Patterned Magnetic Media Obtained by Ion Irradiation

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