Low Damage Reductive Patterning of Oxidized Alkyl Self-Assembled Monolayers through Vacuum Ultraviolet Light Irradiation in an Evacuated Environment
Author:
Affiliation:
1. Department of Materials Science and Engineering, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto 606-8501, Japan
Funder
Japan Society for the Promotion of Science
Ministry of Higher Education
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.7b02739
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3. Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates
4. Regulation of Pattern Dimension as a Function of Vacuum Pressure: Alkyl Monolayer Lithography
5. Hydrophilic/Hydrophobic Film Patterning by Photodegradation of Self-Assembled Alkylsilane Multilayers and Its Applications
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