On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas-Reference-Cited by-同舟云学术

On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas

Published:2017-10-11 Issue:43 Volume:33 Page:12114-12119
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Fan Zheng¹^ORCID,Maurice Jean-Luc¹,Chen Wanghua¹^ORCID,Guilet Stéphane²,Cambril Edmond²,Lafosse Xavier²,Couraud Laurent²,Merghem Kamel²,Yu Linwei¹³^ORCID,Bouchoule Sophie²,Roca i Cabarrocas Pere¹

Affiliation:

1. LPICM, CNRS, Ecole Polytechnique, Université Paris-Saclay, 91128 Palaiseau, France

2. Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Sud, Université Paris-Saclay, C2N-Marcoussis, 91460 Marcoussis, France

3. School of Electronic Science and Engineering, Nanjing University, 210096 Nanjing, China

Funder

Agence Nationale de la Recherche

China Scholarship Council

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.7b01743

Reference37 articles.

1. 25th Anniversary Article: Semiconductor Nanowires - Synthesis, Characterization, and Applications

2. Silicon Nanowires for Biosensing, Energy Storage, and Conversion

3. Nanowire photonics

4. Semiconductor nanowire devices

5. Growth of nanowires

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