Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants-Reference-Cited by-同舟云学术

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Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants

Published:2023-10-05 Issue:41 Volume:39 Page:14670-14679
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Hanzawa Masaki¹,Ogura Taku¹²^ORCID,Akamatsu Masaaki²³^ORCID,Sakai Kenichi²⁴^ORCID,Sakai Hideki²⁴

Affiliation:

1. NIKKOL GROUP Nikko Chemicals Co., Ltd., 3-24-3 Hasune, Itabashi, Tokyo 174-0046, Japan

2. Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan

3. Department of Chemistry and Biotechnology, Faculty of Engineering, Tottori University, 4-101 Koyama-Minami, Tottori 680-8552, Japan

4. Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.3c02034

Reference47 articles.

1. Rosan, M. J.; Kunjappu, J. T. Surfactants and Interfacial Phenomena, 4th ed. Wiley, 2012; pp 392–420.

2. Laundry Detergents: An Overview

3. Use of surfactants to remove water based inks from plastic films

4. Surfactants: toxicity, remediation and green surfactants

5. In situ and real-time metrology during rinsing of micro- and nano-structures

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