High Temperature Induced Low Friction and Wear in a-C:Si via Formation of a “H Passivation Layer/a-SiO<sub>2</sub>/H Passivation Layer” Structure in a Humid Environment-Reference-Cited by-同舟云学术

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High Temperature Induced Low Friction and Wear in a-C:Si via Formation of a “H Passivation Layer/a-SiO₂/H Passivation Layer” Structure in a Humid Environment

Published:2024-08-15 Issue: Volume: Page:
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lu Suifeng¹,Duan Fangli¹^ORCID

Affiliation:

1. State Key Laboratory of Mechanical Transmissions, Chongqing University, Chongqing 400030, China

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.4c01667

Reference51 articles.

1. Friction and wear properties in dry, water- and oil-lubricated DLC against alumina and DLC against steel contacts

2. The effect of relative humidity on wear of a diamond-like carbon coating

3. Effect of relative humidity on the tribological properties of hydrogenated diamond-like carbon films in a nitrogen environment

4. The high-temperature tribological properties of Si-DLC films

5. From DLC to Si-DLC based layer systems with optimized properties for tribological applications

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