Large Area, 38 nm Half-Pitch Grating Fabrication by Using Atomic Spacer Lithography from Aluminum Wire Grids-Reference-Cited by-同舟云学术

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Large Area, 38 nm Half-Pitch Grating Fabrication by Using Atomic Spacer Lithography from Aluminum Wire Grids

Published:2006-11-01 Issue:12 Volume:6 Page:2723-2727
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Liu Xiaoming¹,Deng Xuegong¹,Sciortino Paul¹,Buonanno Mike¹,Walters Frank¹,Varghese Ron¹,Bacon Joel¹,Chen Lei¹,O'Brie Nada¹,Wang Jian Jim¹

Affiliation:

1. Nanoopto Corporation, 1600 Cottontail Lane, Somerset, New Jersey 08873

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl061669s

Reference31 articles.

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3. 300 mm Large Area Wire Grid Polarizers with 50 nm Half-Pitch by ArF Immersion Lithography;Nanomaterials;2022-01-29

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5. Nanowire Grid Reflecting Polarizers for Ultraviolet Applications;IEEE Photonics Journal;2020-12

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