Patterning of Solid Films via Selective Atomic Layer Deposition Based on Silylation and UV/Ozonolysis
Author:
Affiliation:
1. Department of Chemistry, University of California, Riverside, California 92521, United States
Funder
Basic Energy Sciences
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.6b07192
Reference43 articles.
1. Advances in top–down and bottom–up surface nanofabrication: Techniques, applications & future prospects
2. Patterning: Principles and Some New Developments
3. Lithography and Other Patterning Techniques for Future Electronics
4. A critical literature review of focused electron beam induced deposition
5. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art
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