Imido Complexes Derived from the Reactions of Niobium and Tantalum Pentachlorides with Primary Amines: Relevance to the Chemical Vapor Deposition of Metal Nitride Films-Reference-Cited by-同舟云学术

Imido Complexes Derived from the Reactions of Niobium and Tantalum Pentachlorides with Primary Amines: Relevance to the Chemical Vapor Deposition of Metal Nitride Films

Published:1996-01-01 Issue:17 Volume:35 Page:4910-4920
ISSN:0020-1669
Container-title:Inorganic Chemistry
language:en
Short-container-title:Inorg. Chem.

Author:

Jayaratne Kumudini C.¹,Yap Glenn P. A.¹,Haggerty Brian S.¹,Rheingold Arnold L.¹,Winter Charles H.¹

Affiliation:

1. Departments of Chemistry, Wayne State University, Detroit, Michigan 48202, and University of Delaware, Newark, Delaware 19716

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ic960178f

Reference37 articles.

1. Transition temperatures and crystal structures of single‐crystal and polycrystalline NbNx films

2. Process control for the low temperature deposition of niobium-nitride thin films

3. High‐temperature contact structures for silicon semiconductor devices

4. Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

5. Structural and electrical properties of Ta and Ta nitrides deposited by chemical vapour deposition

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