Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement
Author:
Affiliation:
1. Department of Materials Science and Engineering, KAIST, Daejeon, 305-701, Republic of Korea, and Department of Chemistry and School of Molecular Science (BK21), KAIST, Daejeon, 305-701, Republic of Korea
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl9004833
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