Competing Mechanisms in Atomic Layer Deposition of Er2O3 versus La2O3 from Cyclopentadienyl Precursors-Reference-Cited by-同舟云学术

Competing Mechanisms in Atomic Layer Deposition of Er2O3 versus La2O3 from Cyclopentadienyl Precursors

Published:2009-12-04 Issue:1 Volume:22 Page:117-129
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Nolan Michael¹,Elliott Simon D.¹

Affiliation:

1. Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm902469c

Reference50 articles.

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4. Charge conduction mechanisms of atomic-layer-deposited Er2O3 thin films

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