Boundary Layer Chemistry Probed by in Situ Infrared Spectroscopy during SiO2 Deposition at Atmospheric Pressure from Tetraethylorthosilicate and Ozone-Reference-Cited by-同舟云学术

Boundary Layer Chemistry Probed by in Situ Infrared Spectroscopy during SiO2 Deposition at Atmospheric Pressure from Tetraethylorthosilicate and Ozone

Published:2005-08-05 Issue:34 Volume:109 Page:16544-16553
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Flores Lucio D.¹,Crowell John E.¹

Affiliation:

1. Department of Chemistry and Biochemistry, University of California at San Diego, La Jolla, California 92093-0314

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0518658

Reference48 articles.

1. A spectral analysis method to directly determine minority carrier generation lifetime using the pulsed MOS structure

2. Optimization of SiO2 film conformality in TEOS/O3 APCVD

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