Ferroelectric Domain Wall Delayer and Low-Dropout Regulator-Reference-Cited by-同舟云学术

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Ferroelectric Domain Wall Delayer and Low-Dropout Regulator

Published:2024-04-02 Issue:15 Volume:16 Page:19691-19698
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Li Yiming¹,Hu Di¹^ORCID,Sun Jie¹^ORCID,Zhang Wendi¹,Jiang Anquan¹²

Affiliation:

1. State Key Laboratory of ASIC & System, School of Microelectronics, Fudan University, Shanghai 200433, China

2. Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai 200433, China

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Shanghai Center of Brain-inspired Intelligent Materials and Devices

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c18979

Reference40 articles.

1. Design Trends and Perspectives of Digital Low Dropout Voltage Regulators for Low Voltage Mobile Applications: A Review

2. Evaluation and Perspective of Analog Low-Dropout Voltage Regulators: A Review

3. A Current-Mode Buck Converter With Reconfigurable On-Chip Compensation and Adaptive Voltage Positioning

4. A 56-Gb/s Reconfigurable Silicon-Photonics Transmitter Using High-Swing Distributed Driver and 2-Tap In-Segment Feed-Forward Equalizer in 65-nm CMOS

5. Domain Wall Conductivity in La-DopedBiFeO3

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