Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS<sub>2</sub> Thin Films at 150 °C-Reference-Cited by-同舟云学术

Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS₂ Thin Films at 150 °C

Published:2023-07-17 Issue:29 Volume:15 Page:35565-35579
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Mattinen Miika¹^ORCID,Schulpen Jeff J. P. M.¹,Dawley Rebecca A.²^ORCID,Gity Farzan³^ORCID,Verheijen Marcel A.¹⁴^ORCID,Kessels Wilhelmus M. M.¹^ORCID,Bol Ageeth A.¹²^ORCID

Affiliation:

1. Department of Applied Physics and Science Education, Eindhoven University of Technology, PO Box 513, Eindhoven 5600 MB, The Netherlands

2. Department of Chemistry, University of Michigan, 930 North University Avenue, Ann Arbor, Michigan 48109-1055, United States

3. Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork T12 R5CP, Ireland

4. Eurofins Materials Science Netherlands, High Tech Campus 11, Eindhoven 5656 AE, The Netherlands

Funder

Science Foundation Ireland

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c02466

Reference70 articles.

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