Patterning of Self-Assembled Pentacene Nanolayers by Extreme Ultraviolet-Induced Three-Dimensional Polymerization-Reference-Cited by-同舟云学术

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Patterning of Self-Assembled Pentacene Nanolayers by Extreme Ultraviolet-Induced Three-Dimensional Polymerization

Published:2010-09-03 Issue:9 Volume:4 Page:4997-5002
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Jee Hae-geun¹,Hwang Han-Na¹,Han Jin-Hee²,Lim Jun¹,Shin Hyun-Joon¹,Kim Young Dok³,Solak Harun H.⁴,Hwang Chan-Cuk¹

Affiliation:

1. Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784, Korea

2. Department of Physics, Pohang University of Science and Technology (POSTECH), Pohang 790-784, Korea

3. Department of Chemistry, Sungkyunkwan University (SKKU), Suwon 440-746, Korea

4. Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, Villigen Ch-5232, Switzerland

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn1005705

Reference35 articles.

1. http://www.itrs.net/Links/2007ITRS/Home2007.htm. Accessed March 19, 2010.

2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

3. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

4. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

5. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

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1. Hydrophilic/Hydrophobic Film Patterning by Photodegradation of Self-Assembled Alkylsilane Multilayers and Its Applications;Langmuir;2014-08-13

2. Conductive nanofibres and nanocoatings for smart textiles;Multidisciplinary Know-How for Smart-Textiles Developers;2013

3. Resistless patterning of a chlorine monolayer on a Si(001) surface with an electron beam;Applied Surface Science;2011-08

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