Understanding the Surface Diffusion Processes during Magnetron Sputter-Deposition of Complex Oxide Mg–Al–O Thin Films
Author:
Affiliation:
1. Research Group PLASMANT, Department of Chemistry, University of Antwerp (UA), Universiteitsplein 1, Antwerp B-2610, Belgium
2. Theoretical Division, T-1, MS B268, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States
Publisher
American Chemical Society (ACS)
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cg200318h
Reference25 articles.
1. Deposition of complex multielemental thin films
2. Fundamental understanding and modeling of reactive sputtering processes
3. Modelling of reactive sputtering processes involving two separated metallic targets
4. Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering
5. Compositional effects on the growth of Mg(M)O films
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